PolyNano M6.2.1 First generation process finger print – design, test and validation: Draft

The possibility of producing with high volume Lab‐on‐Chip (LoC) devices through injection moulding is presented. Preparation of master geometries was made by etching a Si wafer by e‐beam lithography. Subsequent nickel electroplating was employed to replicate the obtained geometries on the tool, which was used to mould on transparent polymer substrates the functional structures.

To assess the critical factors affecting the replication quality throughout the different steps of the proposed process chain, test geometries were designed and produced on the side of the functional features. The so called “Finger Print” of the lithography and moulding processes was qualitatively and quantitatively evaluated through scanning electron microscopy and atomic force microscopy respectively.

The entire process chain is therefore characterized and the degree of replication among the different replication steps quantified with precise measurements using a high accuracy relocation technique on the produced key test geometries. Based on the obtained results the second generation of finger print will be designed and produced strictly following geometrical requirements of the different biomedical applications.

This will improve the knowledge of the different fabrication processes involved in PolyNano and their capabilities on producing the required nanostructures. Moreover the needs of ensure reproducibility and provide traceable geometrical measuring methods will be developed in parallel with the new specifications/standards rules to design LoC devices.