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Conference paper

Atomistic approach for modeling metal-semiconductor interfaces

In Proceedings of the 16th International Conference on Nanotechnology — 2016, pp. 895-898
From

QuantumWise A/S1

Department of Micro- and Nanotechnology, Technical University of Denmark2

Theoretical Nanoelectronics, Department of Micro- and Nanotechnology, Technical University of Denmark3

We present a general framework for simulating interfaces using an atomistic approach based on density functional theory and non-equilibrium Green's functions. The method includes all the relevant ingredients, such as doping and an accurate value of the semiconductor band gap, required to model realistic metal-semiconductor interfaces and allows for a direct comparison between theory and experiments via the I–V curve.

In particular, it will be demonstrated how doping — and bias — modifies the Schottky barrier, and how finite size models (the slab approach) are unable to describe these interfaces properly due to a poor representation of space-charge effects.

Language: English
Publisher: IEEE
Year: 2016
Pages: 895-898
Proceedings: 2016 IEEE 16th International Conference on Nanotechnology
ISBN: 1509014934 , 1509014942 , 9781509014934 and 9781509014941
Types: Conference paper
DOI: 10.1109/NANO.2016.7751401
ORCIDs: Brandbyge, Mads

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