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Conference paper

Doped silicon plasmonic nanotrench structures for mid-infrared molecular sensing

From

Technical University of Denmark1

Process engineering, National Centre for Nano Fabrication and Characterization, Technical University of Denmark2

National Centre for Nano Fabrication and Characterization, Technical University of Denmark3

Department of Photonics Engineering, Technical University of Denmark4

Metamaterials, Department of Photonics Engineering, Technical University of Denmark5

Highly doped silicon can be a plasmonic material with negative permittivity for mid-infrared wavelengths. In such case high aspect ratio plasmonic Si trench structures can enhance sensitivity of molecular detection with mid-infrared absorption spectroscopy.

Language: English
Year: 2019
Proceedings: 9th International Conference on Surface Plasmon Photonics
Types: Conference paper
ORCIDs: Shkondin, Evgeniy , Vertchenko, Larissa , Laurynenka, Andrei and Takayama, Osamu

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