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Conference paper

Fast silicon etching by plasma-sheath-lens focused negative ions

In Book of Abstracts — 2009, pp. 14-16

By Stamate, Eugen1,2

From

Risø National Laboratory for Sustainable Energy, Technical University of Denmark1

Plasma Physics and Technology Programme, Risø National Laboratory for Sustainable Energy, Technical University of Denmark2

Language: English
Year: 2009
Pages: 14-16
Proceedings: 17th International Colloquium on Plasma Processes
Types: Conference paper
ORCIDs: Stamate, Eugen
Keywords

Fusion energy Fusionsenergi Plasma processing Plasmaprocessering

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