Journal article
Plasma diagnostics by detecting the ion flux profile to a biased-target
Department of Electrical Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan1
Department of Systems Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan2
Department of Materials Processing Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan3
A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content.
The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.
| Language: | English |
|---|---|
| Year: | 2003 |
| Pages: | 65-68 |
| ISSN: | 18793347 and 02578972 |
| Types: | Journal article |
| DOI: | 10.1016/S0257-8972(03)00151-8 |
