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journal:(Microelectronic AND Engineering) AND title:(Laser AND lithography AND on AND resist AND bi-layer AND for AND nanoelectromechanical AND systems AND prototyping)

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1 Journal article

Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping

Forsén, Esko Sebastian; Carlberg, P.; Montelius, L.; Boisen, Anja

Microelectronic Engineering — 2004, Volume 73–74, pp. 491-495

Year: 2004

Language: English

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2 Journal article

Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping

Forsén, E.; Carlberg, P.; Montelius, L.; Boisen, A.

Microelectronic Engineering — 2004

We present a laser lithography technique based on lift-off, for fast and flexible prototyping of micro and nanoelectromechanical systems (MEMS/NEMS). The technique is based on direct laser writing on substrates coated with a resist bi-layer consisting of polymethyl methacrylate (PMMA) on lift-off

Year: 2004

Language: English

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