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Journal article

Gettering in PolySi/SiOx Passivating Contacts Enables Si-Based Tandem Solar Cells with High Thermal and Contamination Resilience

From

National Centre for Nano Fabrication and Characterization, Technical University of Denmark1

Uppsala University2

University of Oslo3

Photovoltaic Materials and Systems, Department of Electrical and Photonics Engineering, Technical University of Denmark4

Department of Electrical and Photonics Engineering, Technical University of Denmark5

Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark6

Plasma Aided Nanotechnology, Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark7

Multijunction solar cells in a tandem configuration could further lower the costs of electricity if crystalline Si (c-Si) is used as the bottom cell. However, for direct monolithic integration on c-Si, only a restricted number of top and bottom cell architectures are compatible, due to either epitaxy or high-temperature constraints, where the interface between subcells is subject to a trade-off between transmittance, electrical interconnection, and bottom cell degradation.

Using polySi/SiOx passivating contacts for Si, this degradation can be largely circumvented by tuning the polySi/SiOx stacks to promote gettering of contaminants admitted into the Si bottom cell during the top cell synthesis. Applying this concept to the low-cost top cell chalcogenides Cu2ZnSnS4 (CZTS), CuGaSe2 (CGSe), and AgInGaSe2 (AIGSe), fabricated under harsh S or Se atmospheres above 550 °C, we show that increasing the heavily doped polySi layer thickness from 40 to up to 400 nm prevents a reduction in Si carrier lifetime by 1 order of magnitude, with final lifetimes above 500 μs uniformly across areas up to 20 cm2.

In all cases, the increased resilience was correlated with a 99.9% reduction in contaminant concentration in the c-Si bulk, provided by the thick polySi layer, which acts as a buried gettering layer in the tandem structure without compromising the Si passivation quality. The Si resilience decreased as AIGSe > CGSe > CZTS, in accordance with the measured Cu contamination profiles and higher annealing temperatures.

An efficiency of up to 7% was achieved for a CZTS/Si tandem, where the Si bottom cell is no longer the limiting factor.

Language: English
Publisher: American Chemical Society
Year: 2022
Pages: 14342-14358
ISSN: 19448252 and 19448244
Types: Journal article
DOI: 10.1021/acsami.2c00319
ORCIDs: Martinho, Filipe , Engberg, Sara , Stamate, Eugen , Schou, Jørgen , Canulescu, Stela , Hansen, Ole , 0000-0002-7392-4701 and 0000-0002-6554-9673
Other keywords

chalcogenides gettering tandem

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