Journal article
Surface morphology of PS-PDMS diblock copolymer films
Spin coated thin films (∼400 Å) of poly(styrene)–poly(dimethylsiloxane) (PS–PDMS) diblock copolymers have been investigated using X-ray Photoelectron Spectroscopy and Atomic Force Microscopy. Surface segregation of the poly(dimethylsiloxane) blocks was studied for five diblock copolymers which ranged in molecular weight from 7 kg/mol to 500 kg/mol.
The films were annealed above and below the highest glass transition temperature of the two polymer blocks but below the order–disorder transition temperature. Information concerning the chemical in-depth distribution of the films was extracted by use of peak shape analysis of the X-ray Photoelectron Spectra via the Tougaard Method.
The amount of dimethylsiloxane in the uppermost part of the films was quantified as a function of annealing time and temperature. For annealing above the PS glass transition temperature, surface segregation of the dimethylsiloxane chain-ends occurs for all the studied PS–PDMS diblock copolymers. At room temperature, surface segregation takes place only when the amount of dimethylsiloxane in the diblock copolymers is small.
Language: | English |
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Year: | 2001 |
Pages: | 93-110 |
ISSN: | 18732526 and 03682048 |
Types: | Journal article |
DOI: | 10.1016/S0368-2048(01)00329-2 |
ORCIDs: | Larsen, N.B. and Almdal, K. |