About

Log in?

DTU users get better search results including licensed content and discounts on order fees.

Anyone can log in and get personalized features such as favorites, tags and feeds.

Log in as DTU user Log in as non-DTU user No thanks

DTU Findit

Conference paper

Accuracy of micro four-point probe measurements on inhomogeneous samples: A probe spacing dependence study

From

Silicon Microtechnology Group, MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark1

MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark2

Department of Micro- and Nanotechnology, Technical University of Denmark3

Nanointegration Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark4

NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark5

Magnetic Systems Group, LabChip Section, Department of Micro- and Nanotechnology, Technical University of Denmark6

LabChip Section, Department of Micro- and Nanotechnology, Technical University of Denmark7

In this paper, we discuss a probe spacing dependence study in order to estimate the accuracy of micro four-point probe measurements on inhomogeneous samples. Based on sensitivity calculations, both sheet resistance and Hall effect measurements are studied for samples (e.g. laser annealed samples) with periodic variations of sheet resistance, sheet carrier density, and carrier mobility.

With a variation wavelength of ¿, probe spacings from 0.0012 to 1002 have been applied to characterize the local variations. The calculations show that the measurement error is highly dependent on the probe spacing. When the probe spacing is smaller than 1/40 of the variation wavelength, micro four-point probes can provide an accurate record of local properties with less than 1% measurement error.

All the calculations agree well with previous experimental results.

Language: English
Publisher: IEEE
Year: 2009
Pages: 1-6
Proceedings: 17th International Conference on Advanced Thermal Processing of Semiconductors RTP09
ISBN: 1424438144 , 1424438152 , 9781424438143 and 9781424438150
ISSN: 1944026x and 19440251
Types: Conference paper
DOI: 10.1109/RTP.2009.5373449
ORCIDs: Petersen, Dirch Hjorth and Hansen, Ole

DTU users get better search results including licensed content and discounts on order fees.

Log in as DTU user

Access

Analysis