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Conference paper

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

In Conference on Lasers and Electro-optics and 2006 Quantum Electronics and Laser Science Conference. Cleo/qels 2006 — 2006, pp. 1-2

By Olsen, Brian Bilenberg^1,2; Frandsen, Lars Hagedorn^3,4; Nielsen, Theodor^1,2; Vogler, Marco; Borel, Peter Ingo^3,4; Kristensen, Anders^1,2

From

Lab-on-a-Chip, Department of Micro- and Nanotechnology, Technical University of Denmark¹

Department of Micro- and Nanotechnology, Technical University of Denmark²

Nanophotonics, Department of Photonics Engineering, Technical University of Denmark³

Department of Photonics Engineering, Technical University of Denmark⁴

Abstract

We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.

Language:	English
Publisher:	IEEE
Year:	2006
Pages:	1-2
Proceedings:	Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006
ISBN:	1557528136 and 9781557528131
ISSN:	21609004 and 21608989
Types:	Conference paper
DOI:	10.1109/CLEO.2006.4628228
ORCIDs:	Frandsen, Lars Hagedorn and Kristensen, Anders

Keywords

(130.3120) Integrated optics devices (220.4000) Microstructure fabrication Electron beams Fabrication Nanoscale devices Photonic crystals Resists Silicon Writing

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

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