Journal article
A compact system for large-area thermal nanoimprint lithography using smart stamps
NSE-Optofluidics Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark1
NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark2
Department of Micro- and Nanotechnology, Technical University of Denmark3
Silicon Microtechnology Group, MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark4
MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark5
Center for Individual Nanoparticle Functionality, Centers, Technical University of Denmark6
Center for Nanoteknologi, Centers, Technical University of Denmark7
We present a simple apparatus for thermal nanoimprint lithography. In this work, the stamp is designed to significantly reduce the requirements for pressure application on the external imprint system. By MEMS-based processing, an air cavity inside the stamp is created, and the required pressure for successful imprint is reduced.
Additionally, the stamp is capable of performing controlled demolding after imprint. Due to the complexity of the stamp, a compact and cost-effective imprint apparatus can be constructed. The design and fabrication of the advanced stamp as well as the simple imprint equipment is presented. Test imprints of micrometer- and nanometer-scale structures are performed and characterized with respect to uniformity across a large area (35 mm radius).
State-of-the-art uniformity for mu m-scale features is demonstrated.
| Language: | English |
|---|---|
| Year: | 2008 |
| Pages: | 055018 |
| ISSN: | 13616439 and 09601317 |
| Types: | Journal article |
| DOI: | 10.1088/0960-1317/18/5/055018 |
| ORCIDs: | Hansen, Ole and Kristensen, Anders |
