Surface investigation of ion dose non-uniformity due to modal and discrete focusing effects during PIII of silicon
(translated: Proceedings of the 6th International Conference on Reactive Plasmas (ICRP))
Year: | 2006 |
---|---|
Pages: | 417-418 |
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(translated: Proceedings of the 6th International Conference on Reactive Plasmas (ICRP))
Year: | 2006 |
---|---|
Pages: | 417-418 |