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Journal article

The influence of nitride thickness variations on the switching speed of MNOS memory transistors

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Department of Electrical Engineering, Technical University of Denmark1

The influence of nitride thickness variations on the switching speed of MNOS memory transistors is examined. The switching time constant is calculated as a function of the nitride thickness using a model of modified Fowler-Nordheim injection. The calculated characteristics compare well with measured characteristics and show a strong dependence on the nitride thickness.

Language: English
Publisher: IEEE
Year: 1978
Pages: 1328-1331
ISSN: 15579646 and 00189383
Types: Journal article
DOI: 10.1109/T-ED.1978.19275
ORCIDs: Bruun, Erik

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