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10 items by relevance
1 Conference paper

Plasmonic color filters fabricated by soft-X-ray lithography

Wu, Qingjun; Jia, Hao; Xiao, Sanshui; Zhang, Dongxian

Soft-X-ray lithography has emerged as a newly technique for manufacturing nanopatterns with both high precision and throughput. Here, we utilize four-beam interference lithography and achromatic Talbot lithography to fabricate high-resolution, and large-area color filters. Conventional top-down

Year: 2019

Language: English

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ab kepohid m cgljfn
2 Journal article

High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography

Sun, Libin; Hu, Xiaolin; Wu, Qingjun; Wang, Liansheng; Zhao, Jun; Yang, Shumin; et al. (5 more)

Optics Express — 2016, Volume 24, Issue 17, pp. 19112-19121

Plasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures

Year: 2016

Language: English

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j kalhdmobngci fep

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