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Journal article

Fabrication of integrated metallic MEMS devices

From

Department of Micro- and Nanotechnology, Technical University of Denmark1

A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

Language: English
Year: 2002
Pages: 1526-1527
ISSN: 1350911x and 00135194
Types: Journal article
DOI: 10.1049/el:20021032
ORCIDs: Hansen, Ole

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