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Journal article

V-groove plasmonic waveguides fabricated by nanoimprint lithography

From

Nanophotonics, Department of Photonics Engineering, Technical University of Denmark1

Department of Photonics Engineering, Technical University of Denmark2

Lab-on-a-Chip, Department of Micro- and Nanotechnology, Technical University of Denmark3

Department of Micro- and Nanotechnology, Technical University of Denmark4

Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integrated optical devices composed of metal V grooves.

This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput. © 2007 American Vacuum Society

Language: English
Publisher: American Vacuum Society
Year: 2007
Pages: 2649-2653
ISSN: 15208567 , 10711023 and 21662754
Types: Journal article
DOI: 10.1116/1.2779041
ORCIDs: Kristensen, Anders
Keywords

Photonics

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