Journal article
Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures
In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved.
The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.
Language: | English |
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Year: | 2012 |
Pages: | 3816-3818 |
ISSN: | 15394794 and 01469592 |
Types: | Journal article |
DOI: | 10.1364/OL.37.003816 |
ORCIDs: | Ou, Yiyu and Ou, Haiyan |