Journal article
A Simplified Diffusion-Deposition Model
The use of a simple top hat plume model facilitates an analytical treatment of the deposition problem. A necessary constraint, however, is that the diffusion velocity (e.g., in terms of the plume growth-rate) is large compared to the deposition velocity. With these limitations, explicit formulae for downwind deposition amounts and ground level atmospheric concentrations are given.
Language: | English |
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Year: | 1980 |
Pages: | 953-956 |
ISSN: | 18732844 , 13522310 , 00046981 and 18782442 |
Types: | Journal article |
DOI: | 10.1016/0004-6981(80)90008-6 |