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Conference paper

Large area negative ion source based on matrix ECR cells for fast silicon etching

In Proceedings — 2009, pp. 49-50

By Stamate, Eugen1,2; Lacoste, A.

From

Plasma Physics and Technology Programme, Risø National Laboratory for Sustainable Energy, Technical University of Denmark1

Risø National Laboratory for Sustainable Energy, Technical University of Denmark2

Language: English
Year: 2009
Pages: 49-50
Proceedings: 31st International Symposium on Dry Process
Types: Conference paper
ORCIDs: Stamate, Eugen
Keywords

Fusion energy Fusionsenergi Plasma processing Plasmaprocessering

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