Journal article
Determination of Stress Build-up during Nanoimprint process in Triangular Polymer Structures
Silicon Microtechnology Group, MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark1
MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark2
Department of Micro- and Nanotechnology, Technical University of Denmark3
NSE-Optofluidics Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark4
NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark5
Center for Nanoteknologi, Centers, Technical University of Denmark6
Center for Individual Nanoparticle Functionality, Centers, Technical University of Denmark7
Nanoimprint process in polymers may cause internal stress accumulation in the imprinted structures that can affect their quality, leading to defects or even fatal cracks. Relaxation effects can also diminish the long term stability of the imprinted features.In this work, direct strain related to residual stress has been characterized by high resolution AFM measurements in triangular shaped lines imprinted in PMMA 50k at different conditions.
Finite elements simulations are in agreement with the experimental observations, and facilitate results interpretations. Relaxation effects have been also studied.
| Language: | English |
|---|---|
| Year: | 2008 |
| Pages: | 838-841 |
| ISSN: | 18735568 and 01679317 |
| Types: | Journal article |
| DOI: | 10.1016/j.mee.2007.11.012 |
| ORCIDs: | Hansen, Ole and Kristensen, Anders |
