Growth and structural characterisation of vanadium oxide ultrathin films on TiO2 (110)

The research activity of our group in the last few years has mainly been devoted to the study of ultrathin vanadium oxide films deposited on a (110)-oriented TiO2 single crystal, in order to prepare systems which may be largely thought of as simplified models for the investigation of the structure/properties relationships in real world catalysts, sensing and optical devices.

The main objective of our work consists of setting up reproducible synthesis routes for the deposition of vanadium oxide ultrathin films on TiO2 (110), through strict control of the reaction parameters. The films obtained are then characterised from a chemical, electronic and structural point of view, and their properties are compared to those of their bulk-related phases.

Results are presented concerning growth procedures and structural and electronic properties of vanadium oxide ultrathin films on titania, with a stoichiometry ranging from VO2, down to approximately VO. In particular, it will be shown that the oxidation product of metallic vanadium in an oxygen or water atmosphere (in the 10−6 mbar range) retains the rutile lattice structure typical of stoichiometric VO2, despite the increasing degree of oxygen defectiveness and the electronic properties, very similar to those pertaining to bulk V2O3.

The peculiar behaviour of vanadium oxide on titania demonstrates how important the epitaxial influence of the substrate is on the nature of the overlayer. These results could represent a good starting point to understand why vanadium oxides on TiO2 show an enhanced catalytic activity and selectivity in many industrially relevant reactions.