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Journal article

Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use

Language: English
Year: 2013
Pages: 7941
ISSN: 20507534 and 20507526
Types: Journal article
DOI: 10.1039/c3tc31498g

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