Journal article
In Situ Tuning of Focused-Ion-Beam Defined Nanomechanical Resonators Using Joule Heating
Department of Micro- and Nanotechnology, Technical University of Denmark1
MEMS-AppliedSensors Group, MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark2
MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark3
Nanomechanical resonators have a huge potential for a variety of applications, including high-resolution mass sensing. In this paper, we demonstrate a novel rapid prototyping method for fabricating nanoelectromechanical systems using focused-ion-beam milling as well as in situ electromechanical characterization using a transmission electron microscope.
Nanomechanical resonators were cut out of thin membrane chips, which have been prefabricated using standard cleanroom processing. We have demonstrated the fabrication of double-clamped beams with feature sizes down to 200 nm using a fabrication time of 30 min per device. Afterwards, the dynamic and structural properties of a double-clamped beam were measured after subsequent Joule heating events in order to ascertain the dependence of the internal structure on the Q-factor and resonant frequency of the device.
It was observed that a change from amorphous to polycrystalline silicon structure significantly increased the resonant frequency as well as the Q-factor of the nanomechanical resonator. Aside from allowing detailed studies of the correlation between internal structure and nanomechanical behavior on an individual rather than a statistical basis, the combination of a short turnaround time and in situ nonlithographic tuning of the properties provide a flexible approach to the development and prototyping of nanomechanical devices.
Language: | English |
---|---|
Publisher: | IEEE |
Year: | 2011 |
Pages: | 1074-1080 |
ISSN: | 19410158 and 10577157 |
Types: | Journal article |
DOI: | 10.1109/JMEMS.2011.2163300 |
ORCIDs: | Booth, Tim , Lei, Anders , Petersen, Dirch Hjorth and Bøggild, Peter |
Focused ion beam Joule heating Q-factor clean rooms double-clamped beam fabrication focused ion beam technology focused-ion-beam in situ tuning focused-ion-beam milling high-resolution mass sensing in situ electromechanical characterization in situ nonlithographic tuning micromechanical resonators milling nanoelectromechancial systems nanoelectromechanical devices nanoelectromechanical system fabrication nanofabrication nanolithography nanomechanical resonators nanopatterning nanotechnology novel rapid prototyping method polycrystalline silicon structure resonant frequency short turnaround time size 200 nm standard cleanroom processing thin membrane chips time 30 min transmission electron microscope transmission electron microscopy