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Phrase:	`"water pump control"` (does not work with wildcards)
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Journal article

Block copolymer lithography: Feature size control and extension by an over-etch technique

In Thin Solid Films — 2012, Volume 522, pp. 318-323

By Rasappa, Sozaraj^1,2,3; Borah, Dipu^1,2,3; Senthamaraikannan, Ramsankar^1,2; Faulkner, Colm C.²; Shaw, Matthew T.^1,2,3,4; Gleeson, Peter^2,4; Holmes, Justin D.^1,2,3; Morris, Michael A.^1,2,3

From

Materials Section, Department of Chemistry, University College Cork, Cork, Ireland¹

Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland²

Tyndall National Institute, Cork, Ireland³

Intel Ireland, Leixlip, Co. Kildare, Ireland⁴

Abstract

Highlights► The over-etch technique is extensible to a range of polymer molecular weights. ► The technique is reliable, reproducible and apposite for large substrate areas. ► Features generated are highly crystalline and show little sign of physical damage.

Language:	English
Year:	2012
Pages:	318-323
ISSN:	18792731 and 00406090
Types:	Journal article
DOI:	10.1016/j.tsf.2012.09.017

Keywords

Block copolymer Lithography Over-etching Plasma etching Polystyrene‐b‐polymethylmethacrylate Self-assembly Silicon nanowires

Block copolymer lithography: Feature size control and extension by an over-etch technique

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Block copolymer lithography: Feature size control and extension by an over-etch technique

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