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Journal article

Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED

From

Thermo Ceramics, Fuel Cells and Solid State Chemistry Division, Risø National Laboratory for Sustainable Energy, Technical University of Denmark1

Fuel Cells and Solid State Chemistry Division, Risø National Laboratory for Sustainable Energy, Technical University of Denmark2

Risø National Laboratory for Sustainable Energy, Technical University of Denmark3

Technical University of Denmark4

Electroceramics, Fuel Cells and Solid State Chemistry Division, Risø National Laboratory for Sustainable Energy, Technical University of Denmark5

Optical Microsensors and Micromaterials, Department of Photonics Engineering, Technical University of Denmark6

Department of Photonics Engineering, Technical University of Denmark7

Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target.

At the initial stage of the growth (average thickness similar to 2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening.

This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.

Language: English
Publisher: Springer-Verlag
Year: 2008
Pages: 705-710
Journal subtitle: Materials Science and Processing
ISSN: 14320630 and 09478396
Types: Journal article
DOI: 10.1007/s00339-008-4700-2
ORCIDs: Pryds, Nini and Schou, Jørgen

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