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Conference paper

Removal of Residues from Reactive Ion Etched Silicon Surfaces Characterized with XPS and SERS

From

Department of Micro- and Nanotechnology, Technical University of Denmark1

Nanoprobes, Department of Micro- and Nanotechnology, Technical University of Denmark2

Language: English
Year: 2014
Proceedings: 40th International Conference on Micro and Nano Engineering
Types: Conference paper
ORCIDs: Boisen, Anja

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