Journal article
Quasi-Random Gratings Enabled by Wrinkled Photoresist Surfaces on a Rigid Substrate
National Centre for Nano Fabrication and Characterization, Technical University of Denmark1
Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark2
Advanced Nanomachining, Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark3
Westlake University4
DENSsolutions5
Micro- A nd nanoscale surface wrinkling has been widely studied in artificial systems, mostly in soft substrates like polydimethylsiloxane or polystyrene, where the wrinkling dynamics are triggered by thermal stresses or tensile prestrains. Here, we introduce a new wrinkling regime based on photoresist layers on top of a rigid substrate.
By introducing a bending deformation, combined with fluorine-based plasma treatment, wrinkles with a characteristic wavelength less than 1 μm can be created. By adding micropatterns on photoresists with standard UV exposure, ordered wrinkles can also be realized. This technique is demonstrated to be applicable in several commercially available photoresists, and the wrinkled patterns can be employed conveniently to create high-aspect-ratio silicon gratings and large-area silicon dioxide membranes.
This unique strategy broadens the spectrum of available materials to create wrinkled surfaces in a controllable manner and provides a platform for the easier fabrication of wrinkle-based devices.
Language: | English |
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Publisher: | American Chemical Society |
Year: | 2021 |
Pages: | 49535-49541 |
ISSN: | 19448252 and 19448244 |
Types: | Journal article |
DOI: | 10.1021/acsami.1c15454 |
ORCIDs: | Chang, Bingdong and 0000-0001-9084-1521 |
photoresist random gratings reactive ion etching thin film wrinkles