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Interpreted as:

title:(Quality AND Control AND of AND JEOL AND JBX-9500 AND E-beam AND Lithography AND System AND in AND a AND Multi-User AND Laboratory)

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1 Conference paper

Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory

Year: 2015

Language: English

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2 Journal article

Quality control of JEOL JBX-9500FSZ e-beam lithography system in a multi-user laboratory

Consistent results on an electron beam lithography instrument pose a major challenge in multi-user open-access nanofabrication laboratories. Calibration can be done using special and dedicated instruments, however, this is time consuming and expensive. We address this challenge by a carefully

Year: 2016

Language: English

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