Journal article
Height patterning of nanostructured surfaces with a focused helium ion beam: a precise and gentle non-sputtering method
University of Southern Denmark1
National Centre for Nano Fabrication and Characterization, Technical University of Denmark2
Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark3
Polymer Microsystems, Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark4
This work presents a new technique for surface patterning with focused ion beams. The technique is based on chemical decomposition in the bulk of a polymer substrate with negligible surface sputtering effects. By using a focused helium ion beam, generated in a helium ion microscope, we show that the surface height of polymethyl methacrylate substrates can be patterned with nanometer depth precision, while preserving the essential features of the nanostructures prefabricated on this surface.
The key factors that control this patterning process are discussed.
| Language: | English |
|---|---|
| Year: | 2020 |
| Pages: | 145303 |
| ISSN: | 13616528 and 09574484 |
| Types: | Journal article |
| DOI: | 10.1088/1361-6528/ab6679 |
| ORCIDs: | Taboryski, Rafael J. , 0000-0002-1432-524X , 0000-0001-8274-9864 , 0000-0002-2436-7283 and 0000-0002-3606-5653 |
