Conference paper · Journal article
Fast thermal nanoimprint lithography by a stamp with integrated heater
TASC National Laboratory1
Center for Nanoteknologi, Centers, Technical University of Denmark2
Metamaterials, Department of Photonics Engineering, Technical University of Denmark3
Department of Photonics Engineering, Technical University of Denmark4
NSE-Optofluidics Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark5
NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark6
Department of Micro- and Nanotechnology, Technical University of Denmark7
Silicon Microtechnology Group, MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark8
MicroElectroMechanical Systems Section, Department of Micro- and Nanotechnology, Technical University of Denmark9
Center for Individual Nanoparticle Functionality, Centers, Technical University of Denmark10
...and 0 moreWe propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz repetition rate current pulses flowing in the conductive layer.
Using this approach we have reproducibly imprinted areas of 2 cm2 within 16 s with residual layers in the range of few tens of nm. This result paves the way for processes in the sub-1 s timescale over large area surfaces.
| Language: | English |
|---|---|
| Year: | 2008 |
| Pages: | 1229-1232 |
| Proceedings: | 33rd International Conference on Micro- and Nano-Engineering |
| ISSN: | 18735568 and 01679317 |
| Types: | Conference paper and Journal article |
| DOI: | 10.1016/j.mee.2008.01.065 |
| ORCIDs: | Rasmussen, Kristian Hagsted , Kristensen, Anders and Hansen, Ole |
