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Conference paper

Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications

From

Department of Photonics Engineering, Technical University of Denmark1

Metamaterials, Department of Photonics Engineering, Technical University of Denmark2

DTU Danchip, Technical University of Denmark3

Quantum and Laser Photonics, Department of Photonics Engineering, Technical University of Denmark4

Department of Micro- and Nanotechnology, Technical University of Denmark5

Polymer Microsystems for Medical Diagnostics, Department of Micro- and Nanotechnology, Technical University of Denmark6

In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches.

In the latter case we show more than 1:20 aspect ratio structures can be achieved.

Language: English
Publisher: IEEE
Year: 2015
Pages: 1-4
Proceedings: 17th International Conference on Transparent Optical Networks
ISBN: 1467378801 , 146737881X , 146737881x , 9781467378802 and 9781467378819
ISSN: 21612064 and 21612056
Types: Conference paper
DOI: 10.1109/icton.2015.7193380
ORCIDs: Shkondin, Evgeniy , Leandro, Lorenzo , Malureanu, Radu , Jensen, Flemming and Lavrinenko, Andrei

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