Conference paper
Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications
Department of Photonics Engineering, Technical University of Denmark1
Metamaterials, Department of Photonics Engineering, Technical University of Denmark2
DTU Danchip, Technical University of Denmark3
Quantum and Laser Photonics, Department of Photonics Engineering, Technical University of Denmark4
Department of Micro- and Nanotechnology, Technical University of Denmark5
Polymer Microsystems for Medical Diagnostics, Department of Micro- and Nanotechnology, Technical University of Denmark6
In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches.
In the latter case we show more than 1:20 aspect ratio structures can be achieved.
Language: | English |
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Publisher: | IEEE |
Year: | 2015 |
Pages: | 1-4 |
Proceedings: | 17th International Conference on Transparent Optical Networks |
ISBN: | 1467378801 , 146737881X , 146737881x , 9781467378802 and 9781467378819 |
ISSN: | 21612064 and 21612056 |
Types: | Conference paper |
DOI: | 10.1109/icton.2015.7193380 |
ORCIDs: | Shkondin, Evgeniy , Leandro, Lorenzo , Malureanu, Radu , Jensen, Flemming and Lavrinenko, Andrei |
AlO-TiO Gold Optical surface waves Plasmons Silicon Surface treatment Surface waves alumina aluminium compounds atomic layer deposition dielectric layers dielectric substrates e-beam deposition gold nanophotonic nanophotonics optical fabrication optical films size 6 nm thin films titania deposition titanium compounds ultra-thin metal ultrathin layers