Journal article
Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy
Department of Mechanical Engineering, University of Texas at Austin, 1 University Station C2200, Austin, TX 78712-0292, USA1
Faculty of Engineering and Natural Science, Sabanci University, Orhanli Tuzla 34956, Istanbul, Turkey2
Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, USA3
Department of Physics, Texas State University, San Marcos, TX 78666, USA4
Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70°C while being exposed to a vapor from hydrazine monohydrate.
The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective.
The overtone region of the Raman spectrum was used, for the first time, to provide a “fingerprint” of changing oxygen content.
| Language: | English |
|---|---|
| Year: | 2009 |
| Pages: | 145-152 |
| ISSN: | 18733891 and 00086223 |
| Types: | Journal article |
| DOI: | 10.1016/j.carbon.2008.09.045 |
