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Journal article

Potential analytical applications of negative ions from a pulsed radiofrequency glow discharge in argon

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EMPA Materials Science and Technology, Feuerwerkerstr. 39, CH-3602, Thun, Switzerland1

Tofwerk AG, Uttigenstrasse 22, CH-3600, Thun, Switzerland2

Detection of negative ions from a conventional analytical glow discharge source using argon as the working gas is reported. The negative ions are recorded using a pulsed discharge source coupled with a time-of-flight mass spectrometer. A considerable enhancement in the “afterglow” region of the negative ion signal for halogens and halogenated molecules and reduction in background is observed.

This is the first time when negative ions have been reported for halogen containing materials and we illustrate our findings with results from the polytetrafluoroethene polymer (PTFE).

Language: Undetermined
Publisher: The Royal Society of Chemistry
Year: 2009
Pages: 178-180
ISSN: 13645544 and 02679477
Types: Journal article
DOI: 10.1039/b818954d

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