About

Log in?

DTU users get better search results including licensed content and discounts on order fees.

Anyone can log in and get personalized features such as favorites, tags and feeds.

Log in as DTU user Log in as non-DTU user No thanks

DTU Findit

Journal article

Optimizing silver-capped silicon nanopillars to simultaneously realize macroscopic, practical-level SERS signal reproducibility and high enhancement at low costs

From

Department of Micro- and Nanotechnology, Technical University of Denmark1

Nanoprobes, Department of Micro- and Nanotechnology, Technical University of Denmark2

Center for Intelligent Drug Delivery and Sensing Using Microcontainers and Nanomechanics, Department of Health Technology, Technical University of Denmark3

The ideal surface-enhanced Raman spectroscopy (SERS) substrate should fulfil the following: (a) predictable SERS enhancement, (b) macroscale SERS signal uniformity, and (c) suitability for mass production at low costs. Macroscale SERS uniformity and reproducibility at practical levels are big obstacles, which have been preventing most SERS substrates from reliable sensing applications.

We have previously shown that SERS-active nanopillar structures, fabricated by lithography-free processes, exhibit high average SERS enhancements and are mass producible. Here, we report an optimized process and show that the improved structures exhibit unrivalled macroscale SERS uniformities (RSD: ∼2.5% in millimeter scale, ∼7% in wafer scale) and reproducibility (RSD: ∼1.5% across 3 wafers), while at the same time exhibiting a very large average SERS enhancement factor of >108.

The obtained SERS uniformity (~2.5% RSD in millimeter scale) is the best to date measured on large-area solid SERS substrates. Fast and reproducible SERS analysis of trans-1,2-bis (4-pyridyl) ethylene down to 4x10-13 mol is demonstrated using the optimized structures. We emphasize that achieving simultaneously macroscopic, practical-level SERS signal reproducibility and high enhancement via a lithography-free process is a notable advance towards industrialization of substrate-based SERS sensors.

Language: English
Year: 2017
Pages: 1808-1818
ISSN: 10974555 and 03770486
Types: Journal article
DOI: 10.1002/jrs.5255
ORCIDs: Wu, Kaiyu , Rindzevicius, Tomas and Boisen, Anja

DTU users get better search results including licensed content and discounts on order fees.

Log in as DTU user

Access

Analysis