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Journal article

Sensitivity analysis for oblique incidence reflectometry using Monte Carlo simulations

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Department of Photonics Engineering, Technical University of Denmark1

Diode Lasers and LED Systems, Department of Photonics Engineering, Technical University of Denmark2

Oblique incidence reflectometry has developed into an effective, noncontact, and noninvasive measurement technology for the quantification of both the reduced scattering and absorption coefficients of a sample. The optical properties are deduced by analyzing only the shape of the reflectance profiles.

This article presents a sensitivity analysis of the technique in turbid media. Monte Carlo simulations are used to investigate the technique and its potential to distinguish the small changes between different levels of scattering. We present various regions of the dynamic range of optical properties in which system demands vary to be able to detect subtle changes in the structure of the medium, translated as measured optical properties.

Effects of variation in anisotropy are discussed and results presented. Finally, experimental data of milk products with different fat content are considered as examples for comparison

Language: English
Year: 2015
Pages: 7099-7105
ISSN: 15394522 , 00036935 and 1559128x
Types: Journal article
DOI: 10.1364/AO.54.007099
ORCIDs: Andersen, Peter E.

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