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Journal article

Photoluminescence Enhancement in Nanotextured Fluorescent SiC Passivated by Atomic Layer Deposited Al2O3 Films

From

Department of Photonics Engineering, Technical University of Denmark1

Diode Lasers and LED Systems, Department of Photonics Engineering, Technical University of Denmark2

Linköping University3

PicoQuant GmbH4

The influence of thickness of atomic layer deposited Al2O3 films on nano-textured fluorescent 6H-SiC passivation is investigated. The passivation effect on the light emission has been characterized by photoluminescence and time-resolved photoluminescence at room temperature. The results show that 20nm thickness of Al2O3 layer is favorable to observe a large photoluminescence enhancement (25.9%) and long carrier lifetime (0.86ms).

This is a strong indication for an interface hydrogenation that takes place during post-thermal annealing. These results show that an Al2O3 layer could serve as passivation in fluorescent SiC based white LEDs applications.

Language: English
Publisher: Trans Tech Publications Ltd
Year: 2016
Pages: 493-496
ISSN: 16629752 , 02555476 and 14226375
Types: Journal article
DOI: 10.4028/www.scientific.net/MSF.858.493
ORCIDs: Lu, Weifang , Ou, Yiyu , Fadil, Ahmed , Petersen, Paul Michael and Ou, Haiyan

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