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Preprint article · Journal article

Magnetoresistance and negative differential resistance in Ni/graphene/Ni vertical heterostructures driven by finite bias voltage: a first-principles study

From

University of Delaware1

QuantumWise A/S2

Department of Physics, Technical University of Denmark3

Computational Atomic-scale Materials Design, Department of Physics, Technical University of Denmark4

Center for Nanostructured Graphene, Centers, Technical University of Denmark5

Using the nonequilibrium Green's function formalism combined with density functional theory, we study finite bias quantum transport in Ni/Grn/Ni vertical heterostructures where n graphene layers are sandwiched between two semi-infinite Ni(111) electrodes. We find that the recently predicted “pessimistic” magnetoresistance of 100% for n≥5 junctions at zero bias voltage Vb→0 persists up to Vb≃0.4 V, which makes such devices promising for spin-torque-based device applications.

In addition, for parallel orientations of the Ni magnetizations, the n=5 junction exhibits a pronounced negative differential resistance as the bias voltage is increased from Vb=0 V to Vb≃0.5 V. We confirm that both of these nonequilibrium transport effects hold for different types of bonding of Gr on the Ni(111) surface while maintaining Bernal stacking between individual Gr layers.

Language: English
Year: 2012
Pages: 6
ISSN: 1550235x , 10980121 and 01631829
Types: Preprint article and Journal article
DOI: 10.1103/PhysRevB.85.184426
ORCIDs: Thygesen, Kristian S.

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