About

Log in?

DTU users get better search results including licensed content and discounts on order fees.

Anyone can log in and get personalized features such as favorites, tags and feeds.

Log in as DTU user Log in as non-DTU user No thanks

DTU Findit

Journal article

Orientation Growth and Magnetic Properties of Electrochemical Deposited Nickel Nanowire Arrays

From

Northeast Petroleum University1

Ulvac Research Center Suzhou Co Ltd2

Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark3

Advanced Nanomachining, Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark4

National Centre for Nano Fabrication and Characterization, Technical University of Denmark5

Department of Health Technology, Technical University of Denmark6

University of Sydney7

Highly ordered ferromagnetic metal nanowire arrays with preferred growth direction show potential applications in electronic and spintronic devices. In this work, by employing a porous anodic aluminum oxide template-assisted electrodeposition method, we successfully prepared Ni nanowire arrays. Importantly, the growth direction of Ni nanowire arrays can be controlled by varying the current densities.

The crystalline and growth orientation of Ni nanowire arrays show effects on magnetic properties. Single-crystallinity Ni nanowires with [110] orientation show the best magnetic properties, including coercivity and squareness, along the parallel direction of the nanowire axis. The current preparation strategy can be used to obtain other nanowire arrays (such as metal, alloy, and semiconductor) with controlled growth direction in confined space, and is therefore of broad interest for different applications.

Language: English
Publisher: MDPI AG
Year: 2019
Pages: 152
ISSN: 20734344
Types: Journal article
DOI: 10.3390/catal9020152
ORCIDs: 0000-0001-5633-3945 and Chang, Bingdong

DTU users get better search results including licensed content and discounts on order fees.

Log in as DTU user

Access

Analysis