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Journal article

Fully etched apodized grating coupler on the SOI platform with −058 dB coupling efficiency

From

Department of Photonics Engineering, Technical University of Denmark1

Nanophotonic Devices, Department of Photonics Engineering, Technical University of Denmark2

Ultra-fast Optical Communication, Department of Photonics Engineering, Technical University of Denmark3

Université de Rennes4

Diode Lasers and LED Systems, Department of Photonics Engineering, Technical University of Denmark5

We design and fabricate an ultrahigh coupling efficiency (CE) fully etched apodized grating coupler on the silicon- on-insulator (SOI) platform using subwavelength photonic crystals and bonded aluminum mirror. Fabrication error sensitivity andcoupling angle dependence are experimentally investigated.

A recordultrahighCE of − 0 . 58 dB with a 3 dB bandwidth of 71 nm and low back reflection are demonstrated.

Language: English
Year: 2014
Pages: 5348-50
ISSN: 15394794 and 01469592
Types: Journal article
DOI: 10.1364/OL.39.005348
ORCIDs: Ding, Yunhong , Ou, Haiyan and Yvind, Kresten

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