Journal article
Double layer resist process scheme for metal lift-off with application in inductive heating of microstructures
Nanoprobes Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark1
NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark2
Department of Micro- and Nanotechnology, Technical University of Denmark3
We present a new method to define metal electrodes on top of high-aspect-ratio microstructures using standard photolithography equipment and a single chromium mask. A lift-off resist (LOR) layer is implemented in an SU-8 photolithography process to selectively remove metal at the end of the processing.
In this way, we have successfully defined metal electrodes on top of 75 mu m high SU-8 microstructures to be used as test structures for the measurement of temperature increase due to inductive heating.
Language: | English |
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Year: | 2010 |
Pages: | 1226-1228 |
ISSN: | 18735568 and 01679317 |
Types: | Journal article |
DOI: | 10.1016/j.mee.2009.11.147 |
ORCIDs: | Keller, Stephan Urs and Boisen, Anja |