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Journal article

Nanopillars: Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy (Adv. Mater. 10/2012)

By Schmidt, Michael Stenbæk1,2; Hübner, Jörg3; Boisen, Anja1,2

From

Department of Micro- and Nanotechnology, Technical University of Denmark1

Nanoprobes, Department of Micro- and Nanotechnology, Technical University of Denmark2

DTU Danchip, Technical University of Denmark3

M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.

Language: English
Publisher: WILEY‐VCH Verlag
Year: 2012
Pages: OP10
ISSN: 15214095 and 09359648
Types: Journal article
DOI: 10.1002/adma.201290051
ORCIDs: Hübner, Jörg and Boisen, Anja
Keywords

Hot spots Leaning silicon nanopillars; Maskless reactive ion etching Substrate fabrication Surface enhanced raman spectroscopy

Other keywords

hot spots leaning silicon nanopillars maskless reactive ion etching substrate fabrication surface enhanced raman spectroscopy

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