Journal article ยท Conference paper
Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity
We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations that occur when different patterns lie in close proximity on the stamp.
Language: | English |
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Year: | 2011 |
Pages: | 2154-2157 |
Proceedings: | 36th International Conference on Micro- and Nano-Engineering |
ISSN: | 18735568 and 01679317 |
Types: | Journal article and Conference paper |
DOI: | 10.1016/j.mee.2010.12.090 |