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Journal article

Wafer scale imprint uniformity evaluated by LSPR spectroscopy: a high volume characterization method for nanometer scale structures: Paper

From

Department of Photonics Engineering, Technical University of Denmark1

Structured Electromagnetic Materials, Department of Photonics Engineering, Technical University of Denmark2

Danish Technological Institute3

Department of Micro- and Nanotechnology, Technical University of Denmark4

Optofluidics, Department of Micro- and Nanotechnology, Technical University of Denmark5

We exploit the localized surface-plasmon resonance (LSPR) of terahertz gold gammadion structures for wafer scale critical dimension metrology of nanostructures. The proposed characterization method, LSPR spectroscopy, is based on optical transmission measurements and is benchmarked against numerical simulations of imprinted structures characterized by atomic force microscopy.

There is a fair agreement between the two methods and the simulations enable the translation of optical spectra to critical dimensions of the physical structures, a concept known from scatterometry. The results demonstrate the potential of LSPR spectroscopy as an alternative characterization method to scanning electron microscopy, atomic force microscopy and scatterometry.

Language: English
Year: 2012
Pages: 385306
ISSN: 13616528 and 09574484
Types: Journal article
DOI: 10.1088/0957-4484/23/38/385306
ORCIDs: Kristensen, Anders and Mortensen, N. Asger

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