Conference paper · Journal article
Virtual subpixel approach for single-mask phase-contrast imaging using Timepix3
University of Copenhagen1
Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark2
Silicon Microtechnology, Nanofabrication, National Centre for Nano Fabrication and Characterization, Technical University of Denmark3
National Centre for Nano Fabrication and Characterization, Technical University of Denmark4
Neutrons and X-rays for Materials Physics, Department of Physics, Technical University of Denmark5
Department of Physics, Technical University of Denmark6
Advacam s.r.o7
European XFEL8
X-ray phase contrast imaging provides a method to distinguish materials with similar density and effective atomic number, which otherwise would be difficult using conventional X-ray absorption contrast. In recent years, multiple methods have been developed to acquire X-ray phase contrast images using incoherent laboratory sources.
The single mask edge illumination setup has been demonstrated as a possible candidate for large scale applications due to its relaxed restrictions on longitudinal coherence and mask alignment, and for its ability to do bi-directional phase contrast images in a single sample exposure. Unfortunately, the single mask edge illumination setup’s refraction sensitivity, and thereby signal to noise, is limited by detector artifacts.
Furthermore, it requires multiple exposures to perform dark-field imaging, a method that enables imaging of micro-structures smaller than the image resolution.
Language: | English |
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Year: | 2019 |
Pages: | C01011-C01011 |
Proceedings: | 20th International Workshop on Radiation Imaging Detectors |
ISSN: | 17480221 |
Types: | Conference paper and Journal article |
DOI: | 10.1088/1748-0221/14/01/C01011 |
ORCIDs: | Silvestre, C. , Khalil, M. , Hemmingsen, J.H. , Hansen, O. , Olsen, U.L. and 0000-0001-9784-7504 |