Journal article
Substrate tolerant direct block copolymer nanolithography
Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale.
PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.
Language: | English |
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Year: | 2016 |
Pages: | 136-140 |
ISSN: | 20403372 and 20403364 |
Types: | Journal article |
DOI: | 10.1039/c5nr06815k |
ORCIDs: | Ndoni, Sokol |