Journal article · Conference paper
Optimization of FIB milling for rapid NEMS prototyping
Nanointegration Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark1
NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark2
Department of Micro- and Nanotechnology, Technical University of Denmark3
We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved.
Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400nm we display what optimized FIB milling in NEMS development can accomplish.
| Language: | English |
|---|---|
| Year: | 2011 |
| Pages: | 2671-2674 |
| Proceedings: | 36th International Conference on Micro- and Nano-Engineering |
| ISSN: | 18735568 and 01679317 |
| Types: | Journal article and Conference paper |
| DOI: | 10.1016/j.mee.2010.11.049 |
| ORCIDs: | Petersen, Dirch Hjorth , Lei, Anders , Booth, Tim and Bøggild, Peter |
