Journal article
Batch fabrication of nanopatterned graphene devices via nanoimprint lithography
Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices.
The nanopatterning process introduces a modest decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.
Language: | English |
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Publisher: | AIP Publishing LLC |
Year: | 2017 |
Pages: | 193103 |
ISSN: | 10773118 and 00036951 |
Types: | Journal article |
DOI: | 10.1063/1.5010923 |
ORCIDs: | 0000-0003-1114-2955 , Whelan, Patrick Rebsdorf , Shivayogimath, Abhay , Petersen, Dirch Hjorth and Bøggild, Peter |