Conference paper
Intensity Mapping for Mask Projection based Photopolymerization
Technical University of Denmark1
Manufacturing Engineering, Department of Mechanical Engineering, Technical University of Denmark2
Department of Mechanical Engineering, Technical University of Denmark3
Visual Computing, Department of Applied Mathematics and Computer Science, Technical University of Denmark4
Department of Applied Mathematics and Computer Science, Technical University of Denmark5
Currently, the industrial de-facto assumption for photopolymerizationsystems is that the ultraviolet light of the mask-projection is uniformly distributed. This paper presents a method for measuring this intensity field or distribution of this mask-projection. By measuring the light distribution, it is shown that the emitted light is not uniformly distributed and thus the current assumption is invalid.
Furthermore, a methodology for obtaining a mask to compensate for the irregularities of the projected light, that will ensure an even and controlled exposure of the photopolymer, is presented. Accordingly, it is demonstrated that this mask compensates for such irregularities, making the light projection significantly more uniformly distributed.
| Language: | English |
|---|---|
| Publisher: | American Society for Precision Engineering |
| Year: | 2018 |
| Pages: | 92-96 |
| Proceedings: | 2018 ASPE and euspen Summer Topical Meeting |
| ISBN: | 1887706763 and 9781887706766 |
| Types: | Conference paper |
| ORCIDs: | Luongo, Andrea , Danielak, Anna H. and Pedersen, David B. |
