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title:(Post-placement AND temperature AND reduction AND techniques)

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1 Conference paper

Post-placement temperature reduction techniques

Liu, Wei; Nannarelli, Alberto

Design, Automation & Test in Europe Conference & Exhibition (date), 2010 — 2010, pp. 634-637

With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial

Year: 2010

Language: English

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2 Conference paper

Post-placement temperature reduction techniques

With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial

Year: 2010

Language: English

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3 Conference paper

Post-placement temperature reduction techniques

Liu, Wei; Nannarelli, Alberto; Calimera, Andrea; Macii, Enrico; Poncino, Massimo

Proceedings of the Conference on Design, Automation and Test in Europe — 2010, pp. 634-637

With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial

Year: 2010

Language: English

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4 Journal article

Layout-Driven Post-Placement Techniques for Temperature Reduction and Thermal Gradient Minimization

With the continuing scaling of CMOS technology, on-chip temperature and thermal-induced variations have become a major design concern. To effectively limit the high temperature in a chip equipped with a cost-effective cooling system, thermal specific approaches, besides low power techniques

Year: 2013

Language: English

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