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Conference paper

Silicon etching by negative ions in ICP and DC discharges produced in Ar/SF6

In Book of Abstracts — 2009

By Draghici, Mihai1,2; Stamate, Eugen1,2

From

Risø National Laboratory for Sustainable Energy, Technical University of Denmark1

Plasma Physics and Technology Programme, Risø National Laboratory for Sustainable Energy, Technical University of Denmark2

Language: English
Year: 2009
Proceedings: 2nd International Conference on Microelectronics and Plasma Technology
Types: Conference paper
ORCIDs: Stamate, Eugen
Keywords

Fusion energy Fusionsenergi Plasma processing Plasmaprocessering

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Analysis